Affiliation:
1. Department of Materials Engineering, Center for Integrated Electronics, Rensselaer Polytechnic Institute, Troy, New York 12180
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dry Etching of Electronic Oxides, Polymers, and Semiconductors;Plasma Processes and Polymers;2005-01-12
2. Plasma Etching in a-Si:H TFT Array Fabrication;Thin Film Transistors;2004
3. Tantalum etching with a nonthermal atmospheric-pressure plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-11
4. Plasma Chemistry;Wiley Encyclopedia of Electrical and Electronics Engineering;1999-12-27
5. Reactive ion etching of Ta-Si-N diffusion barriers in CHF3+O2;Electronics Letters;1995-03-30