Cl2‐Based Inductively Coupled Plasma Etching of NiFe and Related Materials-Reference-Cited by-同舟云学术

Cl2‐Based Inductively Coupled Plasma Etching of NiFe and Related Materials

Published:1998-11-01 Issue:11 Volume:145 Page:4025-4028
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Jung K. B.¹²,Lambers E. S.¹²,Childress J. R.¹²,Pearton S. J.¹²,Jenson M.¹²,Hurst A. T.¹²

Affiliation:

1. Department of Materials Science and Engineering University of Florida, Gainesville, Florida 32611

2. Honeywell, Incorporated, Solid State Electronics Center, Plymouth, Minnesota 55441

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838908/pdf

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