Affiliation:
1. IBM General Technology Division, East Fishkill Facility, Hopewell Junction, New York 12533
2. IBM T. J. Watson Research Center, Yorktown Heights, New York 10598
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
11 articles.
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1. Silicon Epitaxy by Chemical Vapor Deposition;Handbook of Thin Film Deposition Processes and Techniques;2001
2. ULSI Quality Silicon Epitaxial Growth at 850°C;Journal of The Electrochemical Society;1990-07-01
3. References;Thin Films by Chemical Vapour Deposition;1990
4. Recombination lifetime profiling in very thin Si epitaxial layers used for bipolar VLSI;IEEE Electron Device Letters;1989-01
5. Applications of rapid thermal processing to silicon epitaxy;Semiconductor Science and Technology;1988-05-01