The Effect of Glycine and Benzotriazole on Corrosion and Polishing Properties of Cobalt in Acid Slurry-Reference-Cited by-同舟云学术

The Effect of Glycine and Benzotriazole on Corrosion and Polishing Properties of Cobalt in Acid Slurry

Published:2012 Issue:9 Volume:159 Page:C383-C387
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Lu Hai-Sheng,Zeng Xu,Wang Jing-Xuan,Chen Fei,Qu Xin-Ping

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference31 articles.

1. Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers

2. Huang H. Y. Hsieh C. H. Jeng S. M. Tao H. J. Cao M. Mii Y. J. , International Interconnect Tech. Conf., pp. 1 (2010).

3. Lu J. Ha H. C. Aubuchon J. Ma P. Yu S. H. Narasimhan M. , Adv. Metallization Conf., pp. 21-22 (2008).

4. Ma P. Luo Q. Sundarrajan A. Lu J. Aubuchon J. Tseng J. Okazaki1 N. Kumar,M. Wang Y. Wang Y. Chen Y. Naik M. Emesh I. Narasimhan M. , International Interconnect Tech. Conf., pp. 38–40 (2009).

5. Jung H. K. Lee H. B. Tsukasa M. Jung E. Yun J. H. Lee J. M. Choi G. H. Choi S. Chung C. , International Reliability Physics Symposium (IRPS), p.3.E.2.1 (2011).

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