Analysis and Modeling of Low Pressure CVD of Silicon Nitride from a Silane‐Ammonia Mixture: I. Experimental Study and Determination of a Gaseous Phase Mechanism-Reference-Cited by-同舟云学术

Analysis and Modeling of Low Pressure CVD of Silicon Nitride from a Silane‐Ammonia Mixture: I. Experimental Study and Determination of a Gaseous Phase Mechanism

Published:1999-08-01 Issue:8 Volume:146 Page:3009-3017
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Yacoubi Khalid¹,Azzaro‐Pantel Catherine¹,Scheid E.²,Couderc Jean‐Pierre¹

Affiliation:

1. Laboratoire de Génie Chimique UMR CNRS 5503-ENSIGC INPT/UPS, 31078 Toulouse Cedex 04, France

2. CNRS, Laboratoire d'Analyse et d'Architecture des Systèmes, 31077 Toulouse Cedex, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1392044/pdf

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