Affiliation:
1. General Electric Corporate Research and Development, Schenectady, New York 12301
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
17 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Understanding 3D anisotropic reactive ion etching of oxide-metal stacks;Journal of Vacuum Science & Technology B;2023-11-15
2. Chip Integration;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22
3. Metal Polishing Processes;Chemical-Mechanical Planarization of Semiconductor Materials;2004
4. TiN Etching and Its Effects on Tungsten Etching in SF6/Ar Helicon Plasma;Japanese Journal of Applied Physics;1998-03-15
5. Silicides and ohmic contacts;Materials Chemistry and Physics;1998-02