Analytical and Approximate Current Distributions in the Rotating Cylinder Hull Cell

Abstract

The current distribution in the rotating cylinder Hull cell (RCHC) is calculated with analytical methods accounting for primary, secondary and tertiary current effects. The solution is a Fourier-Bessel series, which utilizes the cylindrical geometry of the cell. The primary current distribution is derived for a RCHC of arbitrary dimensions. A similar solution is developed for the simplified case of a linearized polarization curve, which could apply to either the secondary or tertiary current distribution. The results of this analytical method concur with finite element modeling, when compared to copper deposition at a moderately high current density (iavg/iL = ∼0.35). The effects of pulsed plating on the current distribution are also discussed using simplifications and limiting cases where needed. For the specific case of a pulse-rest waveform at high frequency, the current distribution may be modeled with a simple modification to the direct current case. The result of this study allows for current distributions in the RCHC to be calculated without the need for modeling.