Wet Chemical Etching with Lactic Acid Solutions for InP ‐ based Semiconductor Devices-Reference-Cited by-同舟云学术

Wet Chemical Etching with Lactic Acid Solutions for InP ‐ based Semiconductor Devices

Published:1995-10-01 Issue:10 Volume:142 Page:3558-3564
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Ikossi‐Anastasiou K.¹²³,Binari S. C.¹²³,Kelner G.¹²³,Boos J. B.¹²³,Kyono C. S.¹²³,Mittereder J.¹²³,Griffin G. L.¹²³

Affiliation:

1. Department of Electrical and Computer Engineering, Louisiana State University, Baton Rouge, Louisiana 70808, USA

2. Electronic Science and Technology Division, Naval Research Laboratory, Washington, DC 20375, USA

3. Department of Chemical Engineering, Louisiana State University, Baton Rouge, Louisiana 70808, USA

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2050022/pdf

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