Plasma‐Assisted Chemical Vapor Deposition and Characterization of Boron Nitride Films-Reference-Cited by-同舟云学术

Plasma‐Assisted Chemical Vapor Deposition and Characterization of Boron Nitride Films

Published:1994-06-01 Issue:6 Volume:141 Page:1633-1638
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Nguyen S. V.¹²³,Nguyen T.¹²³,Treichel H.¹²³,Spindler O.¹²³

Affiliation:

1. IBM Microelectronics, Hopewell Junction, New York 12533

2. Siemens Components, IBM Facility, Essex Junction, Vermont 05452

3. Siemens AG, Process Engineering and Support, 8000 München 83, Germany

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2054974/pdf

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