Role of Ammonium Ions in Colloidal Silica Slurries for Ru CMP-Reference-Cited by-同舟云学术

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Role of Ammonium Ions in Colloidal Silica Slurries for Ru CMP

Published:2019 Issue:4 Volume:8 Page:P285-P292
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Wang Ziyan^ORCID,Zhou Jianwei,Wang Chenwei^ORCID,Zhang Jiajie,Wang Qinwei^ORCID,Wang Ru

Funder

Hebei Province Science and Technology plan projects Support Program

Colleges and universities of Hebei province reserch projects

Post doctoral priority projects of Hebei province

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Chemical Mechanical Planarization: Slurry Chemistry, Materials, and Mechanisms

2. Controlling the Galvanic Corrosion of Copper during Chemical Mechanical Planarization of Ruthenium Barrier Films

3. Seedless Superfill: Copper Electrodeposition in Trenches with Ruthenium Barriers

4. Potassium Bromate as an Oxidizing Agent in a Titania-Based Ru CMP Slurry

5. Fabrication of ruthenium thin film and characterization of its chemical mechanical polishing process

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Role of alumina particles in chemical-mechanical synergies in ruthenium polishing;Journal of Materials Processing Technology;2024-09

2. Effect of Potassium Ferrocyanide on CMP Performance of Ruthenium in H₂O₂-based Slurries;ECS Journal of Solid State Science and Technology;2024-06-03

3. Effects of pyrazine and its derivatives as inhibitors on copper film chemical-mechanical polishing properties for ruthenium-based copper interconnect;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2024-05

4. Study on Chemical-Mechanical Synergies in Polishing of Ruthenium;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17

5. Triple Synergism Effect of Ammonium Nitrilotriacetate on the Chemical Mechanical Polishing Performance of Ruthenium Barrier Layers;Small;2024-01-21

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