Selective Polishing of Polysilicon during Fabrication of Microelectromechanical Systems Devices-Reference-Cited by-同舟云学术

Selective Polishing of Polysilicon during Fabrication of Microelectromechanical Systems Devices

Published:2009 Issue:6 Volume:156 Page:H487
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Dandu Veera P. R.,Natarajan A.,Hegde S.,Babu S. V.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference44 articles.

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3. Author Index

4. S. Waldis, F. Zamkotsian, P. Lanzoni, W. Noell, and N. De Rooij , inIEEE 21st International Conference, IEEE, Piscataway, NJ, pp. 758–761 (2008).

5. S. Susumu , http://www.hcmlnt.edu.vn/data/Speaker%20Lecture/NNA-50-I-Sugiyama.pdf, last accessed December 2007.

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