Morphology and Composition of Selected High-k Materials and Their Relevance to Dielectric Properties of Thin Films-Reference-Cited by-同舟云学术

Morphology and Composition of Selected High-k Materials and Their Relevance to Dielectric Properties of Thin Films

Published:2008 Issue:5 Volume:155 Page:G97
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Dąbrowski J.,Lippert G.,Oberbeck L.,Schröder U.,Costina I.,Łupina G.,Ratzke M.,Zaumseil P.,Müssig H.-J.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference127 articles.

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3. Rare Earth Oxide Thin Films: Growth, Characterization, and Applications, M. Fanciulli and G. Scarel , Editors, Springer, New York (2006).

4. Rare-earth oxide thin films for gate dielectrics in microelectronics

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