SVM based layout retargeting for fast and regularized inverse lithography

Author:

Luo Kai-sheng,Shi Zheng,Yan Xiao-lang,Geng Zhen

Publisher

Zhejiang University Press

Subject

General Engineering

Reference38 articles.

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3. Chen, Y., Wu, K., Shi, Z., et al., 2007. A feasible model-based OPC algorithm using Jacobian matrix of intensity distribution functions. SPIE, 6520:65204C. [doi:10.1117/12.711763]

4. Chiang, C., Kawa, J., 2007. Design for manufacturability and yield for nano-scale CMOS. Series on Integrated Circuits and Systems. Springer, Dordrecht, The Netherlands, p.58–72. [doi:10.1007/978-1-4020-5188-3]

5. Cobb, N.B., Zakhor, A., 1995. Fast sparse aerial image calculation for OPC. SPIE, 2621:534–545. [doi:10.1117/12.228208]

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