Lactones in 193 nm resists: What do they do?-Reference-Cited by-同舟云学术

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Lactones in 193 nm resists: What do they do?

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXV
language:
Short-container-title:

Author:

Ito Hiroshi,Truong Hoa D.,Brock Phil J.

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physical model-based ArF photoresist formulation development;AIP Advances;2024-02-01

2. Mesoscale modeling: a study of particle generation and line-edge roughness;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-03-12

3. Methacrylate-based polymer films useful in lithographic applications exhibit different glass transition temperature-confinement effects at high and low molecular weight;Polymer;2014-03

4. Understanding dissolution behavior of 193nm photoresists in organic solvent developers;SPIE Proceedings;2012-03-29

5. Particle generation during photoresist dissolution;SPIE Proceedings;2010-03-11

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