Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials-Reference-Cited by-同舟云学术

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Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Huh Sungmin,Kim Hoon,Yoon Gisung,Choi Jaehyuck,Lee Han-Shin,Lee Dong Gun,Ahn Byungsup,Seo Hwan-Seok,Kim Dongwan,Kim Seoung Sue,Cho Han Ku,Watanabe Takeo,Kinoshita Hiroo

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A study on EUV reticle surface molecular contamination under different storage conditions in a HVM foundry fab;SPIE Proceedings;2017-03-27

2. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017

3. Effect of defects on extreme ultraviolet pellicle;SPIE Proceedings;2014-03-18

4. Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy andIn-situContamination System;Japanese Journal of Applied Physics;2012-06-20

5. Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy andIn-situContamination System;Japanese Journal of Applied Physics;2012-06-01

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