Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring-Reference-Cited by-同舟云学术

Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring

Published:2014-11-04 Issue:4 Volume:13 Page:041408
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Settens Charles¹,Cordes Aaron²,Bunday Benjamin²,Bello Abner³,Kamineni Vimal⁴,Paul Abhijeet⁴,Fronheiser Jody⁴,Matyi Richard⁵

Affiliation:

1. State University of New York College of Nanoscale Science and Engineering, Albany, New York 12203, United StatesbSematech, Albany, New York 12203, United States

2. Sematech, Albany, New York 12203, United States

3. GlobalFoundries, Technology Development, Malta, New York 12020, United States

4. GlobalFoundries, Technology Research, Albany, New York 12203, United States

5. State University of New York College of Nanoscale Science and Engineering, Albany, New York 12203, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scattering;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-03-22

2. Unwarping GISAXS data;IUCrJ;2018-10-08

3. Advances in the atomic force microscopy for critical dimension metrology;Measurement Science and Technology;2016-11-18

4. Evaluation of carbon nanotube probes in critical dimension atomic force microscopes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-08-26

5. Rapid ordering of block copolymer thin films;Journal of Physics: Condensed Matter;2016-08-18