Solution for 100 nm: EBM-4000-Reference-Cited by-同舟云学术

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Solution for 100 nm: EBM-4000

Published:2002-07-31 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Hattori Yoshiaki,Hattori Kiyoshi,Murooka Ken-ichi,Abe Takayuki,Yasuda Satoshi,Uno Taiga,Murakami Eiji,Nakayamada Noriaki,Shimomura Naoharu,Yamashita Ttsuyoshi,Yamada Noboru,Sakai Akihiro,Honda Hirohiko,Shimoyama Toshiaki,Nakaso Kiyoshi,Inoue Hideo,Onimaru Yoshiaki,Makiyama Keiichi,Ogawa Yoji,Takigawa Tadahiro

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

2. Study for compensation of unexpected image placement error caused by VSB mask writer deflector;SPIE Proceedings;2012-11-08

3. Performance and stability of mask process correction for EBM-7000;SPIE Proceedings;2010-04-29

4. Proximity Effect Correction for Mask Writing Taking Resist Development Processes into Account;Japanese Journal of Applied Physics;2009-09-24

5. High-accuracy correction of critical dimension errors appearing in large-scale integration fabrication processes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-04-01

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