Author:
Seki Kazunori,Badger Karen,Gallagher Emily,Konishi Toshio,McIntyre Gregory
Cited by
6 articles.
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1. 傅里叶合成照明中的光场均匀化技术研究;Laser & Optoelectronics Progress;2024
2. Evolution of patterning materials towards the Moore’s Law 2.0 Era;Japanese Journal of Applied Physics;2022-04-19
3. Minimizing "Tone Reversal" during 19x nm mask inspection;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12
4. Printability of buried extreme ultraviolet lithography photomask defects;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-01
5. Reflecting on inspectability and wafer printability of multiple EUV mask absorbers;SPIE Proceedings;2013-09-20