Low-voltage electron beam lithography resist processes: top surface imaging and hydrogen silisesquioxane bilayer-Reference-Cited by-同舟云学术

Low-voltage electron beam lithography resist processes: top surface imaging and hydrogen silisesquioxane bilayer

Published:2004-07-01 Issue:3 Volume:3 Page:442
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Jamieson Andrew

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference29 articles.

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2. Generation and applications of finely focused beams of low‐energy electrons

3. Low voltage, high resolution studies of electron beam resist exposure and proximity effect

4. Low-voltage electron beam lithography

5. Low voltage alternative for electron beam lithography

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