Impact of local variability on defect-aware process windows-Reference-Cited by-同舟云学术

Impact of local variability on defect-aware process windows

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
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Author:

Maslow Mark John,Yaegashi Hidetami,Frommhold Andreas,Schiffelers Guido,Wahlisch Felix,Rispens Gijsbert,Slachter Bram,Yoshida Keisuke,Hara Arisa,Oikawa Noriaki,Pathak Abhinav,Cerbu Dorin,Hendrickx Eric,Bekaert Joost

Publisher

SPIE

Reference5 articles.

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2. Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography;Lorusso,2015

3. EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment;Yaegashi,2018

4. Kurtosis as Peakedness, 1905–2014.R.I.P.

5. Improvements in resist performance towards EUV HVM;Yildirim,2017

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4. Highlighting stochastics manifestations in 193nm immersion lithography with contour-based metrology metrics;Metrology, Inspection, and Process Control XXXVI;2022-05-26

5. Pupil optimization for after etch defectivity: what imaging metrics matter?;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-19