1. Stochastic effects in EUV lithography: random, local CD variability, and printing failures;De Bisschop;Journal of Micro/Nanolithography, MEMS, and MOEMS,2017
2. Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography;Lorusso,2015
3. EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment;Yaegashi,2018
4. Kurtosis as Peakedness, 1905–2014.R.I.P.
5. Improvements in resist performance towards EUV HVM;Yildirim,2017