Design rule exploration for width sensitive zone for metal layers in advanced nodes

Author:

Su Xiaojing,Dong Lisong,Wei Yayi,Su Yajuan,Chen Rui,Du Chunshan

Publisher

SPIE

Reference11 articles.

1. Understanding the forbidden pitch phenomenon and assist feature placement;Shi,1993

2. Forbidden pitch or duty-free: revealing the causes of across-pitch imaging differences

3. Forbidden pitches in sub-wavelength lithography and their implications on design

4. Forbidden pitch improvement using modified illumination in lithography

5. Process window discovery, expansion and control of design hotspots susceptible to overlay failures;Sah;International Convention on Information & Communication Technology, Electronics & Microelectronics,2017

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