Perspectives of reactive ion etching of silicate glasses for optical microsystems-Reference-Cited by-同舟云学术

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Perspectives of reactive ion etching of silicate glasses for optical microsystems

Published:2021-12-22 Issue:04 Volume:1 Page:
ISSN:2708-5260
Container-title:Journal of Optical Microsystems
language:
Short-container-title:J. Optical Microsystems

Author:

Weigel Christoph¹,Brokmann Ulrike²,Hofmann Meike³,Behrens Arne³,Rädlein Edda²,Hoffmann Martin⁴,Strehle Steffen¹,Sinzinger Stefan³

Affiliation:

1. Technische Universität Ilmenau, Institute of Micro- und Nanotechnologies IMN MacroNano®, Microsystem

2. Technische Universität Ilmenau, Institute of Micro- und Nanotechnologies IMN MacroNano®, Department

3. Technische Universität Ilmenau, Institute of Micro- und Nanotechnologies IMN MacroNano®, Fachgebiet

4. Ruhr University Bochum, Chair of Microsystems Technology, Bochum

Funder

Bundesministerium für Bildung und Forschung

Publisher

SPIE-Intl Soc Optical Eng

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching;Applied Physics Letters;2024-02-12

2. Glass and Glass/LTCC Interposers as Heterogenous Integration Platform;2024 Pan Pacific Strategic Electronics Symposium (Pan Pacific);2024-01-29

3. Additive, subtractive and formative manufacturing of glass-based functional micro/nanostructures: A comprehensive review;Materials & Design;2023-09

4. A paradigm change: Focused Electron Beam Nanostructuring of Glass;2023-07-13

5. The role of silanol groups on the reaction of SiO₂ and anhydrous hydrogen fluoride gas;Journal of the American Ceramic Society;2023-03-09

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