Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography-Reference-Cited by-同舟云学术

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Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
language:
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Author:

Leclercq Jean-Louis,Soppera Olivier,Caillau Mathieu,Chevalier Céline,Crémillieu Pierre,Delair Thierry,Laurenceau Emmanuelle,Chevolot Yann,Leuschel Benjamin,Ray Cédric,Moulin Christophe,Jonin Christian,Benichou Emmanuel,Brevet Pierre-François,Yeromonahos Christelle

Publisher

SPIE

Reference37 articles.

1. Green chemistry: challenges and opportunities

2. Origins, Current Status, and Future Challenges of Green Chemistry

3. Green nanotechnology;Smith,2011

4. Lithography – Green and Getting Greener

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process;Journal of Vacuum Science & Technology B;2023-10-31

2. Green deep‐UV photoresist based on chitosan for microelectronics;Journal of Applied Polymer Science;2023-06-02

3. Proton beam writing: World experience and prospectives in Ukraine;Nuclear Physics and Atomic Energy;2023-03-25

4. Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography;ACS Applied Polymer Materials;2022-05-20

5. Quadratic nonlinear optics to assess the morphology of riboflavin doped chitosan for eco-friendly lithography;Optical Materials;2018-06

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