Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application-Reference-Cited by-同舟云学术

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Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
language:
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Author:

Liu Sam,Liu Jingjing,Yang Andy,Guo Moran,He Jun,Guo Longxia,Shi Xiaolong,Liu Leon,Jia Ninging,Hsu Stephen D.,Feng Yaobin,Howell Rafael,Gupta Rachit,Zhang Cuiping,Lu Jun-Wei,Wang Jun,Peng Austin,Li Zero,Peng Victor,Xu Gang,Song Zhiyang

Publisher

SPIE

Reference13 articles.

1. Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems;Melville,2011

2. Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performanc;Hsu,2009

3. An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging;Hsu,2008

4. Design compliant source mask optimization (SMO).;Socha,2010

5. EUV source-mask optimization for 7nm node and beyond.;Liu,2014

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse lithography technology: 30 years from concept to practical, full-chip reality;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-31

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