Surface characterization of tin-based inorganic EUV resists-Reference-Cited by-同舟云学术

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Surface characterization of tin-based inorganic EUV resists

Published:2018-03-13 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXV
language:
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Author:

Frederick Ryan T.,Diulus John T.,Hutchison Danielle C.,Olsen Morgan R.,Lyubinetsky Igor,Nyman May,Herman Gregory S.

Publisher

SPIE

Reference23 articles.

1. Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

2. Extreme ultraviolet resist materials for sub-7 nm patterning

3. Chemical and Structural Investigation of High-Resolution Patterning with HafSOx

4. Low-LER Tin Carboxylate Photoresists using EUV;Del Re,2015

5. Extreme ultraviolet patterning of tin-oxo cages;Haitjema,2017

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography;ACS Applied Materials & Interfaces;2024-07-22

2. Insight into the evolution upon ionization from tin-oxo cage photoresist and counterions by DFT calculation;New Journal of Chemistry;2023

3. Photoresist for Extreme Ultraviolet Lithography;2020 International Workshop on Advanced Patterning Solutions (IWAPS);2020-11-05

4. Alkyltin Keggin clusters as EUVL photoresist technology;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26

5. Organotin Carboxylate Reagents for Nanopatterning: Chemical Transformations during Direct-Write Electron Beam Processes;Chemistry of Materials;2019-06-04

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