Mask CD relationship to temperature at the time backscatter is received-Reference-Cited by-同舟云学术

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Mask CD relationship to temperature at the time backscatter is received

Published:2017-07-13 Issue: Volume: Page:
ISSN:
Container-title:Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
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Author:

Fujimura Aki,Zable Harold,Kronmiller Tom,Pearman Ryan,Guthrie Bill,Shirali Nagesh,Masuda Yukihiro,Kamikubo Takashi,Nakayamada Noriaki

Publisher

SPIE

Reference3 articles.

1. Correction of resist heating effect on variable shaped beam mask writer

2. Model-Based Mask Data Preparation (MB-MDP) and its impact on resist heating;Kamikubo,2011

3. Study on modeling of resist heating effect correction in EB mask writer EBM-9000;Nomura,2015

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal analysis with high accuracy of multi-beam mask fabrication;Journal of Vacuum Science & Technology B;2024-04-25

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