Spin-on organic hardmask for topo-patterned substrate-Reference-Cited by-同舟云学术

Spin-on organic hardmask for topo-patterned substrate

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Komura Kazuhiko,Hishiro Yoshi,Wakamatsu Goji,Takimoto Yoshio,Nagai Tomoki,Kimura Tooru,Yamaguchi Yoshikazu,Shimokawa Tsutomu,Breyta Greg,Arellano Noel,Balakrishnan Srinivasan,Bozano Luisa D.,Sankaranarayanan Ananthakrishnan,Bajjuri Krishna M.,Sanders Daniel P.,Larson Carl E.,DeSilva Anuja,Glodde Martin

Publisher

SPIE

Reference15 articles.

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4. Planarization Properties of Resist and Polyimide Coatings

5. Approximating Spun‐On, Thin Film Planarization Properties on Complex Topography

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