The future of EUV lithography: continuing Moore's Law into the next decade-Reference-Cited by-同舟云学术

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The future of EUV lithography: continuing Moore's Law into the next decade

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
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Author:

van Schoot Jan,Troost Kars,Bornebroek Frank,van Ballegoij Rob,Lok Sjoerd,Krabbendam Peter,Stoeldraijer Judon,Benschop Jos,Finders Jo,Meiling Hans,van Setten Eelco,Kneer Bernhard,Kuerz Peter,Kaiser Winfried,Heil Tilmann,Migura Sascha

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficient extreme ultraviolet emission by multiple laser pulses;Applied Physics Letters;2024-07-15

2. Production of 13.5 nm light with 5% conversion efficiency from 2 μ m laser-driven tin microdroplet plasma;Applied Physics Letters;2023-12-04

3. Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review);Journal of Optics;2022-04-22

4. Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range;Journal of Astronomical Telescopes, Instruments, and Systems;2022-02-10

5. Physics of laser-driven tin plasma sources of EUV radiation for nanolithography;Plasma Sources Science and Technology;2019-08-01

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