<title>Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

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Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

Published:1995-10-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yan Pei-yang,Qian Qi-De,McCall Joan,Langston Joseph C.,Ger Yu S.,Cho Joe S.,Hainsey Robert F.

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Generation of 193-nm Femtosecond Light Pulses and Their Application to Photomask Repair;Journal of the Korean Physical Society;2007-08-14

2. Photomask Fabrication;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

3. Material Processing Using Femtosecond Lasers: Repairing Patterned Photomasks;MRS Bulletin;2006-08

4. Mask Repair;Handbook of Photomask Manufacturing Technology;2005-04-07

5. Femtosecond laser ablation and deposition of metal films on transparent substrates with applications in photomask repair;Commercial and Biomedical Applications of Ultrafast Lasers V;2005-03-21

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