Efficient mask characterization through automated contour and corner rounding extraction-Reference-Cited by-同舟云学术

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Efficient mask characterization through automated contour and corner rounding extraction

Published:2023-10-05 Issue: Volume: Page:
ISSN:
Container-title:38th European Mask and Lithography Conference (EMLC 2023)
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Author:

Zimmermann Rainer,Bekaert Joost,Braylovska Mariya,Baskaran Balakumar,Philipsen Vicky,Bohn Martin,Bachmann Michael,Klostermann Ulrich,Hendrickx Eric,Demmerle Wolfgang

Publisher

SPIE

Reference8 articles.

1. Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

2. Curvilinear masks: an overview

3. Impact of mask corner rounding on pitch 40 nm contact hole variability;Van Look,2021

4. Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

5. Synopsys S-Metro data sheet: https://www.synopsys.com/silicon/mask-synthesis/s-metro.html

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