1. International Technology Roadmap for Semiconductors, http://www.itrs.net/Links/2013ITRS/Home2013.htm, (2013), Table LITH5.
2. Rigorous Simulation of 3D Masks;Burger,2006
3. Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography Masks;Burger,2011
4. The impact of 14-nm photomask uncertainties on computational lithography solutions;Sturtevant,2013
5. Simulation study of repeatability and bias in the critical dimension scanning electron microscope;Villarrubia,2005