Defect detection strategies and process partitioning for single-expose EUV patterning-Reference-Cited by-同舟云学术

Defect detection strategies and process partitioning for single-expose EUV patterning

Published:2018-09-05 Issue:01 Volume:18 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Meli Luciana¹,Petrillo Karen¹,De Silva Anuja¹,Arnold John¹,Felix Nelson¹,Robinson Chris¹,Briggs Benjamin¹,Matham Shravan¹,Mignot Yann¹,Shearer Jeffrey¹,Hamieh Bassem¹,Hontake Koichi²,Huli Lior²,Lemley Corey²,Hetzer Dave²,Liu Eric²,Akiteru Ko²,Kawakami Shinichiro³,Shimoaoki Takeshi³,Hashimoto Yusaku³,Ichinomiya Hiroshi³,Kai Akiko³,Tanaka Koichiro³,Jain Ankit⁴,Choi Heungsoo⁴,Saville Barry⁴

Affiliation:

1. IBM Semiconductor Research, Albany, New York

2. Tokyo Electron Limited, Technology Center America, LLC, Albany, New York

3. Tokyo Electron Kyushu Limited, Kumamoto

4. KLA-Tencor at Albany Nanotech, Albany, New York

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

2. Implementation of full field EUV lithography using the ADT;Goethals,2008

3. Lithographic stochastics: beyond 3σ

4. Study of alternate hardmasks for extreme ultraviolet patterning

5. Stochastic effects in EUV lithography: random, local CD variability, and printing failures

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of Cl₂ Radical on Dry Development of Spin-Coated Metal Oxide Resist;ACS Applied Materials & Interfaces;2024-09-12

2. Future of plasma etching for microelectronics: Challenges and opportunities;Journal of Vacuum Science & Technology B;2024-06-07

3. Stochasticity in extreme-ultraviolet lithography predicted by principal component analysis of Monte Carlo simulated event distributions in resist films;Journal of Applied Physics;2022-08-14

4. Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement;Journal of Vacuum Science & Technology B;2022-05

5. A holistic characterization methodology for stochastic printing failures in EUV contact holes;2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2021-05-10