Rapid full-chip curvilinear OPC for advanced logic and memory-Reference-Cited by-同舟云学术

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Rapid full-chip curvilinear OPC for advanced logic and memory

Published:2021-10-12 Issue: Volume: Page:
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Container-title:Photomask Technology 2021
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Author:

Liubich Vlad,Mizuuchi Keisuke,Tritchkov Alexander,Rathi Ashutosh,Zhang Xima,Kim Isabella,Sturtevant John L.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Curvilinear OPC Workflow for Highly Repetitive Structures and High Aspect Ratio Patterns;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

2. Curvilinear mask process correction: status quo and outlook;37th European Mask and Lithography Conference;2022-11-01

3. Curvilinear OPC Application On 180nm Silicon Photonics Layout For Better Performance;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

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