Thermal aberration control for low-k1 lithography-Reference-Cited by-同舟云学术

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Thermal aberration control for low-k1 lithography

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Uehara Yusaku,Matsuyama Tomoyuki,Nakashima Toshiharu,Ohmura Yasuhiro,Ogata Taro,Suzuki Kosuke,Tokuda Noriaki

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Optimization thermal design method for space cameras based on thermo-optical analysis and Taguchi method;Optical Engineering;2020-07-02

3. Fast thermal aberration model for lithographic projection lenses;Optics Express;2019-11-06

4. Active lens for thermal aberration compensation in lithography lens;Applied Optics;2018-10-08

5. Modeling and optimization of lens heating effect for lithographic projector;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-04-11

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