Pellicle films supporting the ramp to HVM with EUV-Reference-Cited by-同舟云学术

Pellicle films supporting the ramp to HVM with EUV

Published:2017-10-16 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology
language:
Short-container-title:

Author:

van Zwol Pieter Jan,Nasalevich Maxim,Kurganova Evgenia,Voorthuijzen Pim,Vles David,Péter Mária,Symens Wim,van der Zande Wim,Notenboom Arnoud,Klootwijk Johan,van de Kruijs Robbert W.,Giesbers A. J. M. (Jos)

Publisher

SPIE

Reference13 articles.

1. EUV progress toward HVM readiness.;Turkot,2016

2. Grid-supported EUV pellicles: A theoretical investigation for added value;Dhalluin;Photomask and Next-Generation Lithography Mask Technology,2015

3. Investigation of EUV Pellicle Feasibility;Scaccabarozzi;Extreme Ultraviolet (EUV) Lithography,2013

4. Progress on EUV pellicle development.;Zoldesi;SPIE Advanced Lithography,2014

5. Fabrication of a full size EUV pellicle based on silicon nitride.;Goldfarb,2015

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical study of extreme ultraviolet pellicles with nanometer thicknesses;Solid-State Electronics;2024-06

2. Comparative Study of the Thermal Stability of Be-Based Extreme Ultraviolet Pellicles;Technical Physics;2023-12

3. Enhanced Thermal Conductivity of Free-Standing Double-Walled Carbon Nanotube Networks;ACS Applied Materials & Interfaces;2023-10-27

4. Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range;Russian Microelectronics;2023-10

5. Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range;Микроэлектроника;2023-09-01