Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond-Reference-Cited by-同舟云学术

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Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond

Published:2017-12-27 Issue:04 Volume:16 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Bakshi Vivek¹,Mizoguchi Hakaru²,Liang Ted³,Grenville Andrew⁴,Benschop Jos⁵

Affiliation:

1. EUV Litho, Inc.10202 Wommack RoadAustin, Texas 78748

2. Gigaphoton400 Yokokura-shindenOyama, Tochigi, Japan

3. Intel CorporationSC2-12, 3065 Bowers AvenueSanta Clara, California 95054

4. Inpria2001 NW Monroe AvenueCorvallis, Oregon 97330

5. ASMLDe Run 6501, 5504 DR VeldhovenThe Netherlands

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes;ACS Applied Materials & Interfaces;2024-09-12

2. Multilayer Reflective Coatings for BEUV Lithography: A Review;Nanomaterials;2021-10-20

3. Synthesis and structural analysis of Mo/B periodical multilayer X-ray mirrors for beyond extreme ultraviolet optics;Materials & Design;2021-01

4. The effect of longer-range waviness on X-ray reflectivity measurements;Journal of Synchrotron Radiation;2021-01-01

5. X-Ray Calc: A software for the simulation of X-ray reflectivity;SoftwareX;2020-07

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