High accuracy electromagnetic full-chip modeling for curvilinear mask OPC and ILT-Reference-Cited by-同舟云学术

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High accuracy electromagnetic full-chip modeling for curvilinear mask OPC and ILT

Published:2024-04-10 Issue: Volume:11854-06 Page:23
ISSN:
Container-title:DTCO and Computational Patterning III
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Author:

Sakr Enas,Levinson Zac,DeLancey Rob,Lee C. Jay,Li Jinguang,Chen Ryan,Iwanow Robert,Yang Delian,Latinwo Folarin,Lucas Kevin,Liu Peng

Publisher

SPIE

Reference8 articles.

1. Photomask Technology;Klein,2016

2. eBeam Initiative Luminaries survey, September, 2021. https://www.ebeam.org/docs/2021-eBeam-Luminaries-Survey-Final.pdf. Accessed March 8, 2023.

3. Impact of mask corner rounding on pitch 40 nm contact hole variability;Look,2021

4. Apple introduces M2 Ultra. https://www.apple.com/newsroom/2023/06/apple-introduces-m2-ultra/. Accessed March 4, 2024.

5. New methodologies for lower-K1 EUV OPC and RET optimization;Hooker,2020

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