Reflective electron-beam lithography: progress toward high-throughput production capability-Reference-Cited by-同舟云学术

Reflective electron-beam lithography: progress toward high-throughput production capability

Published:2012-03-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies IV
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Author:

Freed Regina,Gubiotti Thomas,Sun Jeff,Kidwingira Francoise,Yang Jason,Ummethala Upendra,Hale Layton C.,Hench John J.,Kojima Shinichi,Mieher Walter D.,Bevis Chris F.,Lin Shy-Jay,Wang Wen-Chuan

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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5. Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin films deposition in solutions;Alternative Lithographic Technologies VII;2015-03-19