Damage behavior of SiO 2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser-Reference-Cited by-同舟云学术

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Damage behavior of SiO 2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser

Published:2001-04-12 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-Induced Damage in Optical Materials: 2000
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Author:

Ikuta Yoshiaki,Kikugawa Shinya,Hirano Masahiro,Hosono Hideo

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving the UV transmittance of synthetic quartz through defect repair methods;Journal of Non-Crystalline Solids;2024-07

2. Repetition rate dependence of absorption of fused silica irradiated at 193 nm;Chinese Optics Letters;2013

3. Light driven self-ordering in fused quartz;Journal of Modern Optics;2008-01-10

4. Site selective bond breaking in random media;Optics Communications;2008-01

5. Improvement of Vacuum-Ultraviolet Transparency of Silica Glass by Modification of Point Defects(Review);Journal of the Ceramic Society of Japan;2007

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