Author:
Hooker Kevin,Lucas Kevin,Küchler Bernd,Kazarian Aram,Xiao Guangming
Cited by
9 articles.
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1. Curvilinear mask handling in OPC flow;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-24
2. Inverse lithography physics-informed deep neural level set for mask optimization;Applied Optics;2023-11-15
3. Voronoi Diagram Based Heterogeneous Circuit Layout Centerline Extraction for Mask Verification;2022 27th Asia and South Pacific Design Automation Conference (ASP-DAC);2022-01-17
4. 极紫外光刻快速掩模优化方法;Acta Optica Sinica;2022
5. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022