Author:
Saksena Pulkit,Thompson Michael,Selcuk Sinan,K.C. Anupam,Pegan Jonathan,Hryn Alexander J.,Aloysius Jinnie,Argekar Sandip,Yadav Mohan S.,Agrawal Abhishek,Hoppe Todd J.,Havelia Sarthak,Mack Chris A.,McCallum Martin,Wallace Charles H.
Reference4 articles.
1. Reducing roughness in extreme ultraviolet lithography;Mack;Journal of Micro/Nanolithography, MEMS, and MOEMS,2018
2. Unbiased roughness measurements: subtracting out SEM effects, part 3;Mack,2019
3. Field Guide to Optical Lithography
4. Tool-to-tool optical proximity effect matching;Van Look,2009