Increasing EUV source efficiency via recycling of radiation power-Reference-Cited by-同舟云学术

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Increasing EUV source efficiency via recycling of radiation power

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Hassanein Ahmed,Sizyuk Valeryi,Sizyuk Tatyana,Johnson Ken

Publisher

SPIE

Reference22 articles.

1. EUV Source for High Volume Manufacturing: Performance at 250 W and Key Technologies for Power Scaling;Fomenkov,2017

2. EUV lithography scanner for sub-8nm resolution;J. Van Schoot,2015

3. The future of EUV lithography: enabling Moore’s Law in the next decade;A. Pirati,2017

4. Line-edge roughness performance targets for EUV lithography;T. Brunner,2017

5. Spectral purification and infrared light recycling in extreme ultraviolet lithography sources

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review;High Power Laser Science and Engineering;2023

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