Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology-Reference-Cited by-同舟云学术

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Published:2015-08-03 Issue:3 Volume:14 Page:031208
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Dixit Dhairya¹,O’Mullane Samuel¹,Sunkoju Sravan¹,Gottipati Abhishek¹,Hosler Erik R.²,Kamineni Vimal²,Preil Moshe³,Keller Nick⁴,Race Joseph⁴,Muthinti Gangadhara Raja⁵,Diebold Alain C.¹

Affiliation:

1. SUNY Polytechnic Institute, College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

2. GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

3. GlobalFoundries, 2600 Great America Way, Santa Clara, California 95054, United States

4. Nanometrics, 550 Buckeye Drive, Milpitas, California 95035, United States

5. IBM Research, 257 Fuller Road, Albany, New York 12203, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Line edge roughness detection using deep UV light scatterometry

2. The international technology roadmap for semiconductors,2015

3. Improved measurement accuracy in optical scatterometry using correction-based library search

4. Fabrication of 28nm pitch Si fins with DSA lithography

5. Mask roughness and its implications for LER at the 22- and 16nm nodes

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advancements in metrology for advanced semiconductor packaging;Optics and Photonics for Advanced Dimensional Metrology III;2024-06-18

2. Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO₂ surfaces;Journal of Vacuum Science & Technology A;2023-03

3. 角度分辨光谱技术及其应用;Acta Optica Sinica;2023

4. Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer;Photomask Technology 2022;2022-12-01

5. Mueller matrix spectroscopic ellipsometry;Advanced Optical Technologies;2022-06-07