Development of high-transmittance phase-shifting mask for ArF immersion lithography

Author:

Ahn Won-suk,Seo Hwan-Seok,Bang Ju-Mi,Kim Ji-Young,Song Jae-Min,Seung Byoung-Hoon,Kim Hee-Bom,Jeon Chan-Uk

Publisher

SPIE

Reference11 articles.

1. Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era;Eom,2008

2. Mask 3D effect on 45-nm imaging using attenuated PSM;Sato,2007

3. Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond);Landie,2011

4. High volume manufacturing capability of negative tone development process;Tarutani,2011

5. Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

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