Evaluation of EUV resist performance using interference lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Evaluation of EUV resist performance using interference lithography

Published:2015-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Buitrago E.,Yildirim O.,Verspaget C.,Tsugama N.,Hoefnagels R.,Rispens G.,Ekinci Y.

Publisher

SPIE

Reference12 articles.

1. T. Wallow, C. Higgins, R. Brainard et al., in SPIE Advanced Lithography. (2008), vol. 6921, pp. 69211F.

2. E. S. Putna, T. R. Younkin, R. Caudillo et al., in SPIE Advanced Lithography.(2010), vol. 7636, pp. 76360P.

3. C. Anderson, in SPIE Advanced Lithography.(2013).

4. High sensitivity chemically amplified EUV resists through enhanced EUV absorption

5. Y. Ekinci, M. Vockenhuber, M. Hojeij et al., in SPIE Advanced Lithography. (2013), vol. 8679, pp. 867910.

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme ultraviolet lithography reaches 5 nm resolution;Nanoscale;2024

2. Development of EUV interference lithography for 25 nm line/space patterns;Micro and Nano Engineering;2023-09

3. Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity;Molecules;2023-08-25

4. One metric to rule them all: new k4 definition for photoresist characterization;Extreme Ultraviolet (EUV) Lithography XI;2020-04-14

5. Improving the resolution and throughput of achromatic Talbot lithography;Journal of Vacuum Science & Technology B;2018-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP