Inverted cylindrical magnetron sputtering for HTSC thin film growth-Reference-Cited by-同舟云学术

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Inverted cylindrical magnetron sputtering for HTSC thin film growth

Published:1992-03-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Geerk Jochen,Linker G.,Meyer O.,Ratzel F.,Reiner J.,Remmel J.,Kroener T.,Henn Ruediger,Massing S.,Brecht E.,Strehlau B.,Smithey R.,Wang R. L.,Wang F.,Siegel M.,Ritschel C.,Rauschenbach Bernd

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal-sensitive BST thin film capacitors for dielectric bolometer prepared by RF magnetron sputtering;Microelectronics Journal;2004-07

2. Preparation of (Ba0.67Sr0.33)TiO3 Thin Films for the Dielectric Bolometer Mode of Uncooled Infrared Focal Plane Arrays;physica status solidi (a);2002-11

3. Dielectric properties of (Ba0.67Sr0.33)TiO3thin film for uncooled infrared focal plane arrays;The European Physical Journal Applied Physics;2002-09

4. Low-loss Ba0.5Sr0.5TiO3 thin films by inverted cylindrical magnetron sputtering;Journal of Applied Physics;2000-09

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