1. Samsung Press Release, “Samsung Electronics Starts Production of EUV-based 7nm LPP Process”, Korea,18/10/2018;Availableat: https://news.samsung.com/global/samsung-electronics-starts-production-of-euvbased-7nm-lpp-process
2. Gearing Up For High-NA EUV, Mark Lapedus: https://semiengineering.com/gearing-up-for-high-na-euv/
3. High Sensitivity Resists for EUV Lithography, T. Manouras et al.,: A Review of Material Design Strategies and Performance Results: https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7466712/
4. High-NA EUV lithography: the next step forward: https://www.imec-int.com/en/articles/high-na-euvl-next-major-step-lithography
5. Imec demonstrates 24nm pitch lines with single exposure: https://www.imec-int.com/en/articles/imec-demonstrates-24nm-pitch-lines-with-single-exposure-euv-lithography-on-asml-s-nxe-3400b-scanner