Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists-Reference-Cited by-同舟云学术

Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists

Author:

Narcross Hannah,Lawson Richard A.,Sharp Brandon,Chun Jun Sung,Neisser Mark,Tolbert Laren M.,Henderson Clifford L.

Publisher

SPIE

Reference9 articles.

2. Methods to Explore and Prevent Pattern Collapse in Thin Film Lithography;Noga,2010

4. Negative-Tone Molecular Resists Based on Cationic Polymerization;Lawson,2009

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