Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists-Reference-Cited by-同舟云学术

Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Thesen Manuel W.,Rumler Maximilian,Schlachter Florian,Grützner Susanne,Moormann Christian,Rommel Mathias,Nees Dieter,Ruttloff Stephan,Pfirrmann Stefan,Vogler Marko,Schleunitz Arne,Grützner Gabi

Publisher

SPIE

Reference27 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Mold-assisted nanolithography: A process for reliable pattern replication

3. Fast fabrication of nano-structured anti-reflection layers for enhancement of solar cells performance using plasma sputtering and infrared assisted roller embossing techniques

4. Nanofeatured anti-reflective films manufactured using hot roller imprinting and self-assembly nanosphere lithography

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A thermomechanical and photochemical description of the phase change process in roll-to-roll nanoimprinting lithography;International Journal of Engineering Science;2021-12

2. A thermomechanical description of the mold filling process in roll-to-roll nanoimprinting lithography;Applications in Engineering Science;2020-03

3. Fluorinated low-viscosity copolymer with enhanced release property for roll-to-plate UV nanoimprint lithography;Nanotechnology;2019-09-26

4. Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-10-21