Absolute wavefront measurement of lithography projection lens using random averaging method-Reference-Cited by-同舟云学术

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Absolute wavefront measurement of lithography projection lens using random averaging method

Published:2023-01-09 Issue: Volume: Page:
ISSN:
Container-title:Advanced Optical Manufacturing Technologies and Applications 2022; and 2nd International Forum of Young Scientists on Advanced Optical Manufacturing (AOMTA and YSAOM 2022)
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Author:

Wang Qinglan,Jianke Li,Haiyang Quan,Junbo Liu,Chuan Jin,Song Hu

Publisher

SPIE

Reference13 articles.

1. Simultaneous measurement of thickness and refractive index using wedge plate lateral shearing interferometry and Fourier transform method [C];Chatterjee,2017

2. Double lateral shearing interferometer for the quantitative measurement of tear film topography

3. Lateral shearing interferometry for high-resolution EUV optical testing[J];Miyakawa,2011

4. Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens;Wu;Chinese Journal Of Lasers,2015

5. 300-mm-aperture phase-shifting Fizeau interferometer

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